Imec demonstrates breakthrough technique to reduce EUV lithography dose requirements, boosting wafer throughput.

Colloidal lithography is a nanofabrication technique that utilizes colloidal particles as masks for creating ordered nanostructures on substrates. This cost-effective and scalable method has gained ...

Xanadu (Xanadu Quantum Technologies Inc.), a world leader in photonic quantum computing, in partnership with Mitsubishi Chemical, a major Japanese chemical manufacturer, has announced the release of a ...

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

What is Block Copolymer Lithography? Block copolymer lithography is a nanofabrication technique that utilizes the self-assembly properties of block copolymers to create ordered nanostructures. Block ...

Scanning probe lithography (SPL) represents a rapidly evolving class of nanofabrication techniques that utilise the precision of scanning probe microscopy to directly manipulate material surfaces at ...

PORTLAND, Ore. — A German company is fielding modeling tools that can help chip makers assess the promise of immersion lithography. Putting a layer of water between a wafer and the stepper lens could ...

Portland, Ore. – A soft-lithography technique that harnesses deoxyribonucleic acid (DNA) as a self-reproducing template is being developed at the Massachusetts Institute of Technology's Supramolecular ...

Nanoimprint lithography (NIL) is a promising technique for fine-patterning with a lower cost than other lithography techniques such as EUV or immersion with multi-patterning. NIL has the potential of ...

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

Nanoimprint lithography (NIL) is a promising technique for fine-patterning with a lower cost than other lithography techniques such as EUV or immersion with multi-patterning. NIL has the potential of ...